Chromium Target for Sputtering and Coating Metal with Customized Size

-We offer high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities. We are well-positioned to fulfill customers' needs and markets' demands by providing a great variety of Chromium Target for Sputtering and Coating Metal with Customized Size.

Product Details

Product Feature

The Chromium sputtering target is manufactured using the best quality material and sophisticated technology under the guidance of our expert team. And it is an excellent coating material for high resolution BE imaging of low Z and biological specimens.

Product Description

The Chromium sputtering target is made from top quality Chromium which has a very fine grain size. In addition, it can be an ideal item as semiconductor type-materials that has proven to be a useful coating. Equipped with high performance, it plays an important role in electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc. What's more, our Chromium sputtering target uses ions generated by an ion source to accelerate and aggregate in a vacuum to form a high-speed energy ion beam, and kinetic energy exchange between ions and solid surface atoms. The atoms on the solid surface are separated from the solid and deposited on the surface of the substrate.