Chromium Target for Sputtering and Coating Metal with Customized Size

-We offer high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities. We are well-positioned to fulfill customers' needs and markets' demands by providing a great variety of Chromium Target for Sputtering and Coating Metal with Customized Size.

Product Details

Chromium Target for Sputtering and Coating Metal with Customized Size

Product Description

-Chromium has a very fine grain size - especially on semiconductor type-materials - and has proven to be a useful coating materials for FESEM applications. Chromium is an oxidising metal and so specimens must be viewed immediately after coating, or stored under vacuum or in inert gas. 

-Chromium has a lower SE yield than Pt, Pt/Pd or Ir. It is an excellent coating material for high resolution BE imaging of low Z and biological specimens.

-We offer high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities. We are well-positioned to fulfill customers' needs and markets' demands by providing a great variety of Chromium Target for Sputtering and Coating Metal with Customized Size. 

-The provided Chromium Target for Sputtering and Coating Metal with Customized Size are manufactured using the best quality material and sophisticated technology under the guidance of our expert team. We are committed to your 100% satisfaction. If you want to learn more about our product, do not hesitate to contact us.

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