Molybdenum Target for Sputtering and Coating Metal with Customized Thickness

-Molybdenum Target for Sputtering and Coating Metal with Customized Thickness are produced by powder metallurgy technology, as a refractory metal, it has very high melting point, as well as high electrical conductivity, good corrosion resistance and environment friendly.

Product Details

Molybdenum Target for Sputtering and Coating Metal with Customized Thickness

Molybdenum Sputtering Target:

Molybdenum Sputtering Target has high-melting, high conductivity and good corrosion resistance .  Molybdenum Sputtering Target is used in STN/TFT-LCD and Ion plating.
Product Description

-Molybdenum Target for Sputtering and Coating Metal with Customized Thickness are produced by powder metallurgy technology, as a refractory metal, it has very high melting point, as well as high electrical conductivity, good corrosion resistance and environment friendly.

-It's widely used for field of TFT-LCD, thin film solar cells and semiconductor fields. With up to 3N5 purity, high density, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

-The purity of molybdenum sputtering target we supply is 99.95% ~99.999%. Of course, we can also supply the purity of product according to your requirements. The processing method we are using is powder metallurgy. In October 2008, we were certified by ISO9001:2000 for all our products. 

Characteristics

1) high melting point, high strength,

2) smooth and clean surface,

3) good conductions, small linear expansion coefficient and good heat-resistance

4) high-density, high temperature oxidation resistance, long service life, resistance to corrosion.

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