-Molybdenum Target for Sputtering and Coating Metal with Customized Thickness are produced by powder metallurgy technology, as a refractory metal, it has very high melting point, as well as high electrical conductivity, good corrosion resistance and environment friendly.
This 4N Molybdenum sputtering target has high-melting, high conductivity and good corrosion resistance. Equipped with advanced process, it has the advantage of high-density, high temperature oxidation resistance, high melting point, high strength and so on.
This 4N Molybdenum sputtering target is produced by powder metallurgy technology, which has longer service life for use. Made from refractory metal, it has very high melting point, as well as high electrical conductivity, with good corrosion resistance. We do promise that it will not produce any kind of toxic substance, which is really environment friendly. Due to the high performance, it can be widely used for field of TFT-LCD, thin film solar cells and semiconductor fields. With up to 3N5 purity, high density, uniform grain size, lower gas content, user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.