This 3N5 Niobium sputtering target is applicable to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our 3N5 Niobium sputtering target possess higher density, fine grain sizes as well as high purity.
Product Feature
This 3N5 Niobium sputtering target can be an ideal facility used in electronical industry as PCB coating, Flat Panel Display industry as LCD coating, Optical coating, Electronic semiconductor, Sputtering material, vacuum coating, PVD film coating and so on.
Product Description
This 3N5 Niobium sputtering target is applicable to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our 3N5 Niobium sputtering target possess higher density, fine grain sizes as well as high purity. Due to the high performance, we do promise that operators will benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers for thin film applications. We will do chemical and physical analysis to each batch of product, and send the COA to you. Compared with ordinary product on the market, our 3N5 Niobium sputtering target has high-melting and high corrosion resistance, which plays an important role in Electronic Industry and Superconducting Industry.
