-Niobium Target for Sputtering and Coating Metal with Customized Size are mainly applied to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity.
Niobium Target for Sputtering and Coating Metal with Customized Size
Niobium Sputtering Target:
Niobium Sputtering Target has high-melting and high corrosion resistance. Niobium Sputtering Target is used in Electronic Industry and Superconducting Industry.
Product Description
-Niobium Target for Sputtering and Coating Metal with Customized Size are mainly applied to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity.
-You can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers for thin film applications. We will do chemical and physical analysis to each batch of product, and send the COA to you.
-With the proficiency of this field, we are capable to present an extensive range of Niobium Target for Sputtering and Coating Metal with Customized Size. Also our products are in competitive price.
Application:
Electronical industry as PCB coating
Flat Panel Display industry as LCD coating
Optical coating
Electronic semiconductor
Sputtering material & vacuum coating
PVD film coating
