N-Type Silicon Target for Sputtering and Coating Metal with Customized Size

-N-Type Silicon Target for Sputtering and Coating Metal with Customized Size are characterized by excellent hardness, optic, dielectric properties, wear and corrosion resistance, which are widely applied to the field of LCD transparent conducting glass, LOW-E building glass and micro-electronics.

Product Details

N-Type Silicon Target for Sputtering and Coating Metal with Customized Size

N-Type Silicon Target 

   N-Type Silicon Target has semiconductor property. N-Type Silicon Target we supply is used as coating film, ceramal and semiconducting material.

Product Description

-N-Type Silicon Target for Sputtering and Coating Metal with Customized Size are characterized by excellent hardness, optic, dielectric properties, wear and corrosion resistance, which are widely applied to the field of  LCD transparent conducting glass, LOW-E building  glass and micro-electronics.

-We can supply N-Type silicon sputtering target as your request. We will do chemical and physical analysis to each batch of product, and send the COA to you. Ensure that we provide each product to meet your requirements. The purity of N-Type silicon sputtering target we supply is more than 99.99%. 

-Of course, we can also supply the purity of product according to your requirements. The processing method we are using is pouring, CZ and smelting. In October 2008, we were certified by ISO9001:2000 for all our products. Therefore, our customers can expect more stable quality of our products.

Product Features 

- High temperature creep resistance

- Corrosion resistance and Oxidation resistance

- Acid and alkali resistance

- Wear resistance& good thermal conductivity

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