Silicon Target for Sputtering and Coating Metal with Customized Size

-We have the particularity to provide Silicon Target for Sputtering and Coating Metal with Customized Size as per customer need, any shape of silicon sputtering targets such as rectangular, annular or oval. We will do chemical and physical analysis to each batch of product, and send the COA to you. Ensure that we provide each product to meet your requirements. The purity of silicon sputtering target we supply is more than 99.99%.

Product Details

Silicon Target for Sputtering and Coating Metal with Customized Size

Silicon Sputtering Target:
Silicon Sputtering Target has semiconductor property. Silicon Sputtering Target we supply is used as coating film, ceramal and semiconducting material.
Product Description

-We have the particularity to provide Silicon Target for Sputtering and Coating Metal with Customized Size as per customer need, any shape of silicon sputtering targets such as rectangular, annular or oval. We will do chemical and physical analysis to each batch of product, and send the COA to you. Ensure that we provide each product to meet your requirements. The purity of silicon sputtering target we supply is more than 99.99%. 

-We can supply polycrystalline silicon sputtering target, monocrystalline silicon sputtering target, P-Type silicon sputtering target, N-Type silicon sputtering target, Undoped silicon sputtering target, Intrinsic silicon sputtering target and other silicon sputtering target as your request. 

-Our standard Silicon Sputtering Targets for thin film are available in monocrystalline silicon, dimensions up to 150 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications.



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