Tantalum Target for Sputtering and Coating Metal with Customized Size

4N Tantalum sputtering target has high-melting and high corrosion resistance. It can be widely used in electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.

Product Details

Product Feature

This 4N Tantalum sputtering target has high-melting and high corrosion resistance, which can be widely used  in electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc. 


Product Description

This 4N Tantalum sputtering target is made from shiny, silvery coloured metal which is heavy, dense, malleable and ductile. In addition, the material of our product is found in small quantities in minerals , and is isolated by conversion to the oxide and then the fluoro-complex. Due to the high performance, it can be an ideal facility for magnetic recording media, printer components, flat panel displays, optic, industrial glass, and thin film resistors. Compared with oridanry target on the market, our 4N Tantalum sputtering target features natural strength with its low thermal expansion coefficient, which make it the perfect choice for a diffusion barrier to prevent copper and silicon from interacting. They can also be applied to wear-resistant materials, with high temperature corrosion resistance. 


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