-Titanium Target for Sputtering and Coating Metal with Customized Size is widely used in Multi-arc ion or Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating, we can provide you different purity according to your different requirements.
This 3N5 Titanium Sputtering Target has the advantage of high corrosion resistance, high strength and lightweight, which can be an ideal item used in chemical industry, coated glass and so on. In order to reduce pores in the solids of the target and improve the properties of the sputtered film, our target is features higher density.
This 3N5 Titanium Sputtering Target plays an important role in Multi-arc ion and Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating. In addition, there are various kinds of purity options, which is available according to your different requirements. Made from top quality Titanium, we do promise that the purity is more than 99.7%. The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. There is no doubt that our product has higher density, with better the performance of the film. What's more, the high density and strength of the target realize the fucntion to better withstand the thermal stresses during sputtering. Due to the proper size and compact design, it is easier for storage.